Tokyo Electron had 97 patents in future of work during Q1 2024. The patents filed by Tokyo Electron Ltd in Q1 2024 focus on temperature control methods for semiconductor wafers, a management system for optimizing substrate manufacturing processes, a mechanism for predicting process value changes, an inspection system for substrates, and a substrate processing system with temperature control components. These innovations aim to improve efficiency and accuracy in semiconductor manufacturing processes. GlobalData’s report on Tokyo Electron gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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Tokyo Electron grant share with future of work as a theme is 57% in Q1 2024. Grant share is based on the ratio of number of grants to total number of patents.
Recent Patents
Application: Temperature control method (Patent ID: US20240103482A1)
The patent filed by Tokyo Electron Ltd. describes a temperature control method for a semiconductor wafer mounted on a table. The method involves supplying a heat transfer gas into the gap between the wafer and the table, measuring temperature variations, calculating correction values, and controlling the power to heaters to reach a target temperature. The method ensures precise temperature control during semiconductor processing.
The claims detail the steps involved in the temperature control method, including providing a substrate on a support surface, supplying heat transfer gas, measuring temperature variations, calculating correction values, and controlling power to heaters. The method can be applied before processing the substrate, with multiple heaters provided in concentric shapes for efficient temperature control. Additionally, the method can be used in plasma processing, with adjustments made to the power supply and gas pressure to achieve the desired temperature for substrate processing. Overall, the patent outlines a comprehensive approach to temperature control in semiconductor processing, ensuring optimal conditions for wafer fabrication.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
