Tokyo Electron had nine patents in advanced materials during Q1 2024. The patent filed by Tokyo Electron Ltd in Q1 2024 describes a substrate processing apparatus with a processing chamber and a substrate support stage. It includes a piezoelectric element around a second nozzle to adjust its opening size based on applied voltage, and a thermoelectric element generating electromotive force from temperature difference in collection pipes. A drive circuit applies voltage to the piezoelectric element based on the electromotive force magnitude. GlobalData’s report on Tokyo Electron gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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Tokyo Electron grant share with advanced materials as a theme is 44% in Q1 2024. Grant share is based on the ratio of number of grants to total number of patents.
Recent Patents
Application: Substrate processing apparatus (Patent ID: US20240079219A1)
The substrate processing apparatus described in the patent includes a processing chamber with a substrate support stage that has recesses for heat transfer medium supply. The apparatus also features piezoelectric and thermoelectric elements to control the flow of the medium based on voltage and temperature differentials. A drive circuit applies voltage to the piezoelectric element based on the generated electromotive force.
Additionally, the apparatus may include a circulation device for medium supply and collection, a second thermoelectric element for generating another electromotive force, and a differential amplifier circuit for processing the electromotive forces. The design of the piezoelectric element can vary, with options for ring-shaped or multiple piezoelectric members with corresponding electrodes. The apparatus can be configured with different zones for substrate support, each with specific recess arrangements for heat transfer medium supply.
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GlobalData, the leading provider of industry intelligence, provided the underlying data, research, and analysis used to produce this article.
GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
