Taiwan Semiconductor Manufacturing has been granted a patent for a reflective mask design. The mask includes layers of substrate, reflective multilayer, capping layer, intermediate layer, absorber layer, and cover layer. The absorber layer consists of Ir, Pt, or Ru based materials. GlobalData’s report on Taiwan Semiconductor Manufacturing gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Taiwan Semiconductor Manufacturing, 3D memory devices was a key innovation area identified from patents. Taiwan Semiconductor Manufacturing's grant share as of January 2024 was 69%. Grant share is based on the ratio of number of grants to total number of patents.
Reflective mask with ir, pt, or ru based absorber layer
A recently granted patent (Publication Number: US11886109B2) discloses a reflective mask design for use in various applications. The reflective mask comprises multiple layers including a substrate, a reflective multilayer, a capping layer, an intermediate layer, an absorber layer, and a cover layer. Notably, the absorber layer contains materials such as Ir, Pt, or Ru based materials, with the option of having multiple layers made of different materials. The design also includes an opening pattern exposing the intermediate layer, and the reflective multilayer consists of alternating Si and Mo layers.
Furthermore, the patent describes variations of the reflective mask design, including the addition of a barrier layer with materials like silicon nitride or graphene, and the use of specific materials in the absorber layer such as Si, B, or N. The intermediate layer is highlighted for its lower hydrogen diffusivity compared to the capping layer, and the capping layer itself includes a combination of materials like RuxM1-x. Additionally, another embodiment of the reflective mask involves multiple reflective multilayers, capping layers, and etch stop layers, with an absorber layer placed in a trench. The design also incorporates protective and antireflective layers for enhanced performance. Overall, the patent showcases innovative features and material compositions aimed at improving the functionality and efficiency of reflective masks in various applications.
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