Lam Research had 15 patents in future of work during Q1 2024. Lam Research Corp has developed systems and methods for real-time temperature control in a plasma chamber by adjusting heater element duty cycles based on sensed voltage. They have also introduced methods and apparatus for processing substrates in a multi-frequency plasma processing chamber, where non-base RF generators switch power levels or frequencies in response to a control signal as the base RF signal pulses. Techniques for determining predefined power levels and RF frequencies for the non-base RF signals in advance are also disclosed. GlobalData’s report on Lam Research gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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Lam Research grant share with future of work as a theme is 53% in Q1 2024. Grant share is based on the ratio of number of grants to total number of patents.
Recent Patents
Application: Real-time control of temperature in a plasma chamber (Patent ID: US20240047183A1)
The patent filed by Lam Research Corp. describes systems and methods for real-time control of temperature within a plasma chamber. One method involves sensing the voltage of a rail connected to a voltage source that supplies power to multiple heater elements in the chamber. This sensed voltage is then used to adjust the duty cycles of the heater elements, ensuring the temperature within the chamber is maintained at a desired level over time.
The system described in the patent includes a heater array with multiple heater elements connected to a voltage source via a rail. A multiplexer is used to receive the measured voltage from the rail and adjust the duty cycles of the heater elements based on this voltage and a nominal voltage from the source. The duty cycles are adjusted to achieve a target temperature within the plasma chamber, with the heater elements arranged in a matrix connected to buses and switches to control the power supply. The multiplexer, consisting of a switch circuit and a processor, controls the operation of the heater elements by adjusting the duty cycles through the opening and closing of switches, ensuring precise temperature control within the plasma chamber.
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