Lam Research had four patents in big data during Q1 2024. Lam Research Corp has developed a virtual fabrication environment for semiconductor device fabrication, which includes an analytics module for key parameter identification, process model calibration, and variability analysis. GlobalData’s report on Lam Research gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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Lam Research grant share with big data as a theme is 50% in Q1 2024. Grant share is based on the ratio of number of grants to total number of patents.
Recent Patents
Application: System and method for performing process model calibration in a virtual semiconductor device fabrication environment (Patent ID: US20240070373A1)
The patent filed by Lam Research Corp discusses a virtual fabrication environment for semiconductor device fabrication that includes an analytics module for key parameter identification, process model calibration, and variability analysis. The system involves performing virtual fabrication runs based on a Design of Experiment (DOE) using 2D design data and a process sequence to build 3D models. Users can select specific targets within the models for variability analysis, with results displayed or exported. The variability analysis results enable the assessment of precision, sigma, and target data normality, and can be displayed simultaneously for multiple targets, which can include metrology, structure search, DTC check, or electrical analysis targets.
The patent also covers a non-transitory computer-readable medium holding instructions for variability analysis, a computing device-implemented method, and a virtual fabrication system. These components follow a similar process of performing virtual fabrication runs, selecting targets for variability analysis, and displaying or exporting the results. The system can handle approximately 200 virtual fabrication runs, assess precision and target data normality, and display results for multiple targets simultaneously. The targets for analysis can include metrology, structure search, DTC check, or electrical analysis targets. Additionally, the system includes a network interface for exporting analysis results, enhancing its functionality and usability in the semiconductor device fabrication process.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
