KLA had one patents in metaverse during Q2 2024. KLA Corp has developed methods and systems for performing spectroscopic ellipsometry measurements on surface structures of optical elements on transparent substrates. The system is designed to prevent contamination from light reflected from the backside of the substrate, resulting in accurate measurements of film and grating structures. The configuration includes a large illumination Numerical Aperture, high demagnification, small measurement spot size, and small depth of focus to minimize backside reflections. GlobalData’s report on KLA gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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KLA had no grants in metaverse as a theme in Q2 2024.
Recent Patents
Application: Methods and systems for scatterometry based metrology of structures fabricated on transparent substrates (Patent ID: US20240201073A1)
The patent filed by KLA Corp. describes methods and systems for performing spectroscopic ellipsometry (SE) measurements on surface structures of optical elements fabricated on transparent substrates. The SE measurement system is designed to detect light from the measured structures without contamination from light reflected from the backside surface of the substrate. By utilizing a large illumination Numerical Aperture (NA) and high demagnification, the system achieves a small measurement spot size and depth of focus, reducing backside reflections. Additionally, a small collection aperture size further minimizes backside reflected light from reaching the detector.
The patent includes claims for a spectroscopic metrology system with specific configurations for illumination and collection optics, detectors, and computing systems to accurately measure parameters of interest characterizing the structures on the transparent substrate. The system is capable of analyzing structures such as film thickness, critical dimensions, grating structures, metalens optical elements, and augmented reality/virtual reality devices. The method outlined in the patent involves generating illumination light, directing it to the measurement spot on the substrate, collecting the light, detecting it, and generating estimated values for parameters of interest based on the collected data. The system and method described in the patent aim to improve the accuracy and efficiency of spectroscopic ellipsometry measurements on optical elements fabricated on transparent substrates.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
