Camtek has developed a semiconductor edge and bevel inspection tool system for wafers. The system includes two illumination setups with different radiation parameters, allowing for precise inspection of the wafer edge and bevel region. The imaging sensor unit collects data to identify boundaries accurately. GlobalData’s report on Camtek gives a 360-degree view of the company including its patenting strategy. Buy the report here.

According to GlobalData’s company profile on Camtek, Pose estimation was a key innovation area identified from patents. Camtek's grant share as of April 2024 was 38%. Grant share is based on the ratio of number of grants to total number of patents.

Semiconductor edge and bevel inspection tool system for wafers

Source: United States Patent and Trademark Office (USPTO). Credit: Camtek Ltd

A semiconductor edge and bevel inspection tool system for a wafer has been granted a patent (Publication Number: US11927545B1). The system comprises a first illumination setup generating radiation towards the wafer edge, an imaging sensor unit collecting light radiation and generating sensing data, and a second illumination setup directing radiation parallel to the wafer plane towards the imaging sensor. The system allows for interaction with the edge and bevel region, with the sensing data indicating the boundary between the wafer plane and the edge and bevel region. The different radiation parameters of the first and second illumination setups, along with the positioning of the setups and the imaging sensor unit, contribute to the effectiveness of the inspection tool system.

The patent also includes various configurations and features of the inspection tool system, such as the spectral properties, illumination duration, and operation modes of the illumination setups. Additionally, the system can detect edge defects and wafer top surface defects, with a control unit managing the operation of the illumination setups and imaging sensor unit. The system is designed to be versatile, capable of inspecting both single wafers and multi-tier stacks, providing valuable data on the boundaries between the planes and edge regions. Overall, the patented semiconductor edge and bevel inspection tool system offers a comprehensive solution for ensuring the quality and integrity of wafers in semiconductor manufacturing processes.

To know more about GlobalData’s detailed insights on Camtek, buy the report here.

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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.