Axcelis Technologies. has been granted a patent for an ion implantation system utilizing a gaseous aluminum-based ion source material, specifically dimethylaluminum chloride (DMAC). The system includes a dual gas supply for DMAC and a co-gas to enhance ion beam quality and reduce contamination. GlobalData’s report on Axcelis Technologies gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Axcelis Technologies, 3D memory devices was a key innovation area identified from patents. Axcelis Technologies's grant share as of July 2024 was 59%. Grant share is based on the ratio of number of grants to total number of patents.
Aluminum ion implantation system using gaseous dmac
The granted patent US12051561B2 describes an aluminum ion implantation source apparatus designed to generate a desired ion beam current of doubly charged aluminum ions (Al++). The apparatus features an arc chamber equipped with a process gas supply line for introducing dimethylaluminum chloride (DMAC) and a distinct co-gas supply line for introducing a fluorine-containing co-gas. A refractory metal shaft is positioned within the arc chamber, and an aluminum-containing ceramic target is placed near the shaft. The shaft can be biased to a negative potential, which facilitates the etching of the ceramic target and the generation of the ion beam current. The apparatus aims to achieve an ion beam current greater than approximately 5 mA.
The patent further details various chemical reactions that occur within the apparatus, including the etching of aluminum-containing ceramics like Al2O3 and AlN, and the interaction of fluorine with hydrogen to produce HF. Additionally, the apparatus is designed to reduce energetic carbon contamination by utilizing fluorine to scavenge hydrogen atoms from carbon and to break carbon-to-carbon bonds. The claims also specify the potential reactions involving the DMAC process gas, such as the formation of aluminum chloride from aluminum and chlorine. Overall, the invention presents a sophisticated approach to aluminum ion implantation, emphasizing the interplay of various gases and the electrical biasing of components to optimize performance.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
