ASM International has filed a patent for a gas distribution system that can monitor and control gas flow rates in multiple channels of a reactor system. The system includes gas supply lines, gas manifolds, gas flow sensors, gas valves, pressure transducers, and a vacuum source. A controller is programmed to maintain the pressure in the gas distribution system within a certain range. GlobalData’s report on ASM International gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on ASM International, 3D memory devices was a key innovation area identified from patents. ASM International's grant share as of September 2023 was 47%. Grant share is based on the ratio of number of grants to total number of patents.
A gas distribution system with independent gas flow control
A recently filed patent (Publication Number: US20230313377A1) describes a gas distribution system that aims to maintain precise pressure control within a reaction chamber. The system includes a first gas supply line connected to a first gas manifold, which has multiple gas outlets. Each gas outlet is equipped with a gas flow sensor and a gas valve. An outlet of each gas valve is connected to a pressure-controlled vent line, which is monitored by a pressure transducer. The pressure transducer measures the pressure within the vent line, while another pressure transducer measures the pressure within the reaction chamber.
To maintain pressure control, a vacuum source is connected to the vent line, and a controller is programmed to operate the vacuum source. The controller ensures that the pressure measured by the pressure transducer in the vent line remains within plus or minus ten percent of the pressure in the reaction chamber. This precise pressure control is crucial for the proper functioning of the gas distribution system.
The patent also mentions additional components and features of the gas distribution system. These include gas selection valves, which are connected to the outlets of the gas valves and the inlet of the vent line. The gas selection valves allow for selective coupling of the gas outlets to the reaction chamber. The system also includes relief valves for venting the gas supply lines, a moisture sample panel, an inert gas inlet valve, and channel purge valves.
Furthermore, the system may incorporate a flange with gas flange channels, where the gas valves are fluidly coupled. This arrangement facilitates the distribution of gas within the system. Additionally, a proportional-integral-derivative (PID) controller is connected to the gas valves, enabling independent adjustment of the gas flow in each valve to desired set points.
Overall, this gas distribution system patent proposes a comprehensive solution for maintaining precise pressure control within a reaction chamber. The combination of gas flow sensors, valves, pressure transducers, a vacuum source, and a controller ensures that the pressure in the vent line closely matches the pressure in the reaction chamber. The additional components and features enhance the functionality and versatility of the system.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
