Applied Materials. has been granted a patent for methods of introducing precursors via a segmented showerhead. The invention involves heating multiple gas delivery portions to different temperatures, utilizing a coplanar, wedge-shaped design that forms a circular showerhead, enhancing gas delivery efficiency. GlobalData’s report on Applied Materials gives a 360-degree view of the company including its patenting strategy. Buy the report here.
According to GlobalData’s company profile on Applied Materials, 3D memory devices was a key innovation area identified from patents. Applied Materials's grant share as of June 2024 was 48%. Grant share is based on the ratio of number of grants to total number of patents.
Segmented showerhead for introducing precursors in semiconductor processes
The patent US12043895B2 outlines a method for introducing precursors through a segmented showerhead designed with multiple fluidly isolated gas delivery portions. Each gas delivery portion features a wedge-shaped body that forms a wedge-shaped plenum, and they are arranged coplanarly to create a circular showerhead. The method involves heating at least two gas delivery portions to different temperatures, with the first portion heated to a range of approximately 200 to 350 degrees Celsius and the second portion heated to a higher range of about 450 to 600 degrees Celsius. Additional gas delivery portions can also be heated to various temperatures, allowing for precise control over the introduction of different process materials.
Moreover, the method includes the potential for enhanced thermal management by incorporating a heat sink with high conductivity between the gas delivery portions to minimize heat transfer. The design allows for gaps between the gas delivery portions, further reducing thermal interaction. The claims also specify the use of temperature sensors to monitor and adjust the heating of the gas delivery portions, ensuring optimal conditions for the introduction of process materials. This innovative approach aims to improve the efficiency and effectiveness of precursor delivery in various applications, particularly in semiconductor manufacturing and related fields.
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