Nova has been granted a patent for an advanced X-ray metrology system featuring a patterned X-ray emitting target. This system includes an electron gun, an X-ray blocking mask, and a detector, enhancing capabilities in X-ray reflectance scatterometry, photoelectron spectroscopy, and fluorescence applications. GlobalData’s report on Nova gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Nova, Pose estimation was a key innovation area identified from patents. Nova's grant share as of June 2024 was 48%. Grant share is based on the ratio of number of grants to total number of patents.
Patterned x-ray emitting targets for metrology systems
The patent US11996259B2 describes an advanced X-ray metrology system designed for precise measurement and analysis of samples with periodic structures. Central to this system is an X-ray source that generates an X-ray beam through an electron gun producing an electron beam directed at a patterned X-ray emitting target. This target features an X-ray blocking mask with openings that allow electrons to pass through and interact with structural elements beneath it, which generate and reflect the X-ray beam. The system also includes a sample holder for positioning the sample, a monochromator to refine the X-ray beam, and a detector to collect scattered X-ray data from the sample.
The claims further detail various configurations and enhancements of the system. Notably, the electron gun can be fixed while the patterned target is either moved or rotated, allowing for flexibility in operation. The design incorporates features to compensate for focal aberrations and to create desired X-ray patterns by considering downstream distortions. Additionally, the X-ray generating structural elements can be substrates with enhanced heat conduction properties, boron doping, or layered structures to improve performance. The patent also specifies the use of materials with varying X-ray absorption characteristics and outlines the potential for displacement of the X-ray generating elements during operation, enhancing the system's adaptability for different measurement scenarios.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
