KLA had five patents in big data during Q4 2023. KLA Corp’s patents filed in Q4 2023 include a metrology system with an imaging system, detectors, and proximity sensors for measuring lateral positions of a stage element. The system is able to adjust the focal plane of detectors and determine metrology measurements on a sample. Another patent describes an inspection system that generates images of sample regions before and after a process step, identifying a test region and comparison regions to detect defects in the test region based on multi-step difference images. GlobalData’s report on KLA gives a 360-degreee view of the company including its patenting strategy. Buy the report here.

KLA grant share with big data as a theme is 60% in Q4 2023. Grant share is based on the ratio of number of grants to total number of patents.

Recent Patents

Application: Extra tall target metrology (Patent ID: US20230324809A1)

The patent filed by KLA Corp describes a metrology system that includes an imaging system with an objective lens, detectors, an objective positioning stage, and proximity sensors. The system captures images of multiple focal planes by adjusting the focal plane of the detectors through movement along the optical axis. It uses lateral positions of a stage element to determine metrology measurements associated with targets on a sample, aligning fields of view and compensating for lateral shifts. The system can be used for overlay metrology, capturing images of different focal planes for accurate measurements.

The system's objective positioning stage allows for fine and coarse adjustments of the focal plane, with maximum adjustment distances specified. Thin flexure arms constrain lateral translation and tilt, ensuring accuracy. The system can capture images using different illumination techniques and is suitable for various sample types, including 3D NAND features. Air bearings support the coarse stage, providing accurate movement along the optical axis. The method for overlay metrology involves receiving lateral positions from proximity sensors, capturing images of multiple focal planes, and determining metrology measurements based on relative feature locations and compensating for lateral shifts. The method ensures accurate alignment and measurement of features on different focal planes for precise metrology.

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